Technical Information

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Technical Information (Etching Process)

Daiwa Techno Systems is an innovator of aperture plates for electron microscopes!

Our perfect clean method
removes even the toughest resist residue.
(PAT No. 3117687)

No more need to worry about static build up.
Now, troublesome bakeout and coating maintenance are no longer a concern!

*Limited to products with Daiwa Techno Systems specifications.

Daiwa Techno Systems is an innovator of aperture plates for electron microscopes!

Before Cleaning

Although resist residue is not visible during the optical microscope inspection at 200x following the photo etching process, when magnified to 1000x and 5000x, the amount of resist residue is clearly visible.

Before Cleaning

Conventional Cleaning

With the conventional inspection standard of 200x, a pre and post cleansing process comparison does not reveal visible differences but if we view the finished product at 1000x and 5000x, we clearly see that dried resist residue has not been completely removed.

Conventional Cleaning

FE Cleaning

However, via our patented FE cleaning process, during visual inspection at 1000x or even 5000x we see clearly that resist residue has been removed completely.

FE Cleaning



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